TiAl Sputtering Target, High Quality, Monolithic, Rotatable, Cylindrical, Straight, Dogbone, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron TiAl Sputtering Targets Manufacturer and Supplier
TITANIUM ALUMINUM (TiAl) SPUTTERING TARGET
Titanium Aluminum Nitride (TiAlN) coating is recommended for applications where heat resistance and extreme hardness is required for abrasive materials. It is a high-performance coating which excels in abrasive and difficult-to-machine materials such as cast iron, aluminum alloys, tool steels, and nickel alloys.

Haohai titanium aluminum (TiAl) sputtering targets and cathodes can provide you an outstanding oxidation-resistant nitride coating (TiAlN) which will well protect your drills, milling machines, index-able cutting inserts and all kind of other cutting tools against wear and therefore extends their service life.
Haohai Titanium Aluminum(TiAl) Sputtering Targets include titanium aluminum(TiAl) rotary sputtering targets, titanium aluminum(TiAl) planar sputtering targets and titanium aluminum(TiAl) cathodic targets.

Titanium Aluminum Rotatable (Rotary, Cylindrical) Sputtering Target
Manufacturing Range
OD (mm)ID (mm)Length (mm)Custom Made
80 - 16060 - 125100 - 4000

Specification
Composition [at%]25/75, 30/70, 33/67, 40/60, 50/50
60/40, 67/33, 70/30, 75/25, 80/20
Purity99.7%
Density3.1 - 4.0 g/cm3
Grain Sizes< 100 micron or on request
Fabrication ProcessesHIP, Plasma Spraying, Machining, Bonding
ShapeStraight, Dog bone
End TypesSCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove,
Custom Made for SS Backing Tube
SurfaceRa 1.6 micron
Other Specification
✦ Vapor degreased and demagnetized after final machining.
✦ ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.
✦ High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.
✦ Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.


Titanium Aluminum Planar (rectangle, circular) Sputtering Target
Manufacturing Range
RectangleLength (mm)Width (mm)Thickness (mm)Custom Made
10 - 200010 - 4005.0 - 40
CircularDiameter (mm)
Thickness (mm)
5.0 - 500
5.0 - 40
Specification
Composition [at%]25/75, 30/70, 33/67, 40/60, 50/50
60/40, 67/33, 70/30, 75/25, 80/20
Purity99.7%
Density3.1 - 4.0 g/cm3
Grain Sizes< 100 micron or on request
Fabrication ProcessesHIP, Machining, Bonding
ShapeMonolithic, Multi-segmented Target, Bonding
TypesPlate, Disc, Step, Down bolting, Threading, Custom Made
SurfaceRa 1.6 micron

Other Specifications
Flatness, clean smooth surface, polished, free of ****, oil, dot, etc.
Excellent conductions, small linear expansion coefficient and good heat-resistance.

Titanium Aluminum arc cathodes
We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets


For our Titanium Aluminum Sputtering Targets and arc cathodes

Tolerance
Acc. to drawings or on request.

Haohai provides Titanium Aluminum Sputtering Targets and arc cathodes continually and improves the following material and coating properties:
✦ Fine grain size and homogeneous microstructure
✦ High Ductility
✦ Outstanding material hardness
✦ Excellent resistance to oxidation
✦ Coefficient of friction
✦ Temperature resistance
✦ Thermal conductivity
✦ High electrical conductivity
✦ Color effects
✦ Antibacterial properties

Impurities Content [wt%]
Titanium/aluminum Content [at%]
30/7033/6750/5060/4070/30
Purity [%]
99.799.799.799.799.7
Metallic Impurities [μg/g]Ti32.7746.3063.772.4978.15
Al67.2053.2035.927.1320.98
Cu0.0020.0020.0020.0020.002
Mn0.010.0080.0040.0040.004
Mg0.030.030.030.030.03
Fe0.120.120.08500850.085
Si0.060.060.0750.0750.061
Non-Metallic Impurities [μg/g]O0.090.090.090.090.09
N0.0030.0030.0030.0030.002
C0.0150.0150.0150.0150.015
Cl0.0130.0130.0130.0130.013
Guaranteed Density [g/cm3]
3.243.2603.613.793.99
Grain Size [μm]
100100100100100
Thermal Conductivity [W/(m·K)]
110102614841
Coefficient of Thermal Expansion [1/K]
20·10-618·10-616·10-615·10-614·10-6

Application
✦ Wear Resistant Coating
✦ Decorative Coating
Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets. Our TiAl sputtering target, with high purity, include bonding or spayed (straight or dogbone) rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality TiAl targets.Alloy Sputtering Targets factory
website:http://www.pvdtarget.com/alloy-sputtering-targets/